HomenewsIndustry newsWhy are Helium Leak Detectors Indispensable in Semiconductor Manufacturing? Core Advantages and Detection Accuracy Analysis

Why are Helium Leak Detectors Indispensable in Semiconductor Manufacturing? Core Advantages and Detection Accuracy Analysis

2025-11-07

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With the expansion of global chip production capacity and advancements in packaging processes, semiconductor manufacturing demands increasingly stringent requirements for cleanliness, airtightness, and vacuum environments. Even the smallest leak in equipment can lead to production line downtime, reduced yield, and even significant losses. Therefore, helium leak detectors, as a commonly used and highly sensitive airtightness testing equipment in the industry, have become an indispensable key instrument in wafer fabs, packaging plants, and lithography and vacuum system maintenance.

Bowei will provide an in-depth analysis from the perspectives of application reasons, detection advantages, working principles, and selection criteria, helping you quickly understand the value of helium leak detection equipment.

Why is Semiconductor Manufacturing Particularly Reliant on Helium Leak Detection?

Semiconductor manufacturing involves a large number of sealed structures such as vacuum chambers, cooling systems, gas pipelines, EUV lithography systems, and packaging equipment. Any leak can cause:

⚠ Decreased vacuum level → affecting the stability of lithography, deposition, and etching processes

⚠ Particle intrusion into the production environment → leading to increased wafer defect rates

⚠ Changes in gas mixing ratios → resulting in uncontrolled etching rates and deposition quality

⚠ Accelerated equipment aging and increased maintenance costs

Helium molecules are small, highly inert, have low background concentration, and diffuse quickly, making them an ideal tracer gas. Therefore, helium leak detection has almost become a standard procedure in the semiconductor industry.

Key Advantages of Helium Leak Detectors

Comparison ItemHelium Leak DetectionTraditional Bubble MethodPressure Decay Method
Accuracy10^-10 mbar·L/s levelLowMedium
On-Site SpeedFastSlowMedium
Suitable for Vacuum System✔ Highly compatible✘ Not applicable
Destructive TestingNoYesNo
Semiconductor Compatibility⭐⭐⭐⭐⭐⭐⭐⭐

Summary of Advantages:

Detection sensitivity down to the nanogram level

Capable of detecting extremely small leaks, suitable for high-end chip manufacturing

Supports online detection, reducing downtime

Uses a safe, inert gas that does not affect equipment structure

Analysis of the Detection Principle of Helium Leak Detectors

Common helium leak detectors utilize mass spectrometry for detection, with the simplified process as follows:

A certain concentration of helium gas is introduced into the device under test.

The instrument extracts a gas sample using a vacuum pump.

The mass spectrometry analysis unit separates and identifies helium molecules.

The leakage rate and location are determined based on the helium concentration.

Detection methods include:

Vacuum Mode: High accuracy, suitable for chambers and wafer processing equipment.

Sniffer Mode: More flexible for on-site leak detection and localization.

Accumulation Method: Suitable for large chambers or low-speed detection processes.

Key selection criteria for helium leak detectors

Selection DimensionRecommended Focus Points
Sensitivity≥10^-9 mbar·L/s, suitable for production line use
Pumping SpeedThe larger, the faster; improves detection efficiency
Detection ModeSupport for both vacuum and sniffing dual-mode
Access ManagementAbility to record data, meeting wafer fab audit requirements
Interface CompatibilityPLC/Ethernet/Automation system integration capability

💡 The more advanced the chip manufacturing process, the higher the requirements for leak detection sensitivity. High-end manufacturers therefore prefer high-sensitivity mass spectrometry leak detection solutions.

Industry Application Scenarios and Case Studies

Typical applications of helium leak detection in the semiconductor field include:

EUV/DUV lithography machine vacuum chamber seal testing

PECVD, ALD, and Etch etching system vacuum leak detection

CMP polishing equipment cooling water circuit leak detection

High-purity gas delivery pipeline leak detection

Packaging, dicing, and testing equipment maintenance and inspection

Many wafer foundries have incorporated helium leak testing as a mandatory step in their equipment maintenance cycles to ensure production line stability.

Summary

With its high sensitivity, rapid leak location capabilities, adaptability to vacuum environments, and safety and stability features, helium leak detectors have become an integral part of the semiconductor manufacturing testing system, serving as a crucial tool for ensuring process yield and stable production line operation. As advanced process nodes develop, the demand for helium leak detection equipment will continue to grow.

If you are considering a helium leak detection solution for your factory, laboratory, or equipment procurement, it is recommended to select a suitable model based on your actual testing requirements, vacuum system scale, and maintenance procedures.